A nonpartisan seminar-colloquium, The Art & Law Program seeks qualified, open-minded and self-motivated individuals with a genuine and rigorous attraction to critical thought and debate. In particular, The Program welcomes candidates who are open to controversial dialogue and who seek to challenge their respective practices. Please note that applicants' work need not engage the law directly.  

With this in mind, there are no exhibition or paper presentations requirements. Rather, participants are highly encouraged to produce – on their own – a static or non-static material with what is learned, or unlearned, during and after The Program. Please note that the Program is not for everyone. Applicants are encouraged to study and fully understand the mission of the Program and speak with alumni regarding the Program’s structure and expectations of its participants.

The Art & Law Program fully believes in freedom of speech and in protecting that freedom when others attempt to restrict it. To that end – and in response to the recent and ongoing debates concerning freedom of expression within educational settings – The Art & Law Program has adopted the following resolution.


The Art & Law Program fellows are required to attend an intensive three-day colloquium that will take place on the weekend of October 25, 26 and 27, each day from 9am to 6pm, and will be held at the Cornell Art Architecture Planning headquarters at 26 Broadway in New York City. The three-day colloquium will conclude with a Sunday evening party where fellows will have a chance to come back to life and connect with Program alumni and friends.

Please note that the Program requires a serious time commitment on your part. Admitted fellows are expected to engage and actively contribute in seminar discussions, as well as read and review all materials before the beginning of the three-day colloquium. Given that lengthy and dense readings are assigned, materials will be made available to admitted fellows six-weeks prior to the beginning of the three-day colloquium. The language of instruction for the Program will be English.

There is a $750 nonrefundable participation fee. All participation fees must be paid in-full on or before August 29, 2019.


Applicants with a minimum three-year professional record are preferred. Visual artists, architects, film makers, writers, and curators may apply. Applicants with backgrounds in art, art history, art criticism, architecture, philosophy, business, economics, sociology, urban planning, political science and history are strongly encouraged to apply. This list is non-exclusive.

Fall 2019 Topic

Taking into consideration recent socio-cultural and political-economic developments in art, law, and education, starting in the fall of 2019 the Program will transition to an intensive three-day colloquium that will focus on specific art and law topics.

In the fall 2019, the Program will examine artists’ legacies and artists’ estates through the lens of tangible and intangible property, contracts, moral rights, and corporations. This will allow us to examine how sectors of the art industry— such as academia, the gallery system, for-profit and non-profit museums, curatorial practices, and law—impact the practices, definitions and controversies of contemporary art and culture.

The three-day symposium will be led by Sergio Muñoz Sarmiento.

How To Apply

Applications for the fall 2019 three-day colloquium are now being accepted. Please note that applications are on Rolling Admissions basis and the deadline for the fall 2019 is August 16, 2019. The online application form is available here. The online application page contains all the necessary application instructions. There is no application fee. 

Work Sample

Visual Artists, Architects, Designers and Film makers:

15 images of recent work and/or up to 10 minutes of recent audio and/or video projects (may include more than one audio or video). Please include an image list detailing title, date, materials, and dimensions or running times.

Writers and Academics:

Two recent writing samples, totaling no more than 30 pages, double spaced. You may also include a link to your blog or other website containing your writings.


A writing sample no longer than 15 pages and 7 images of recent curated exhibitions.


If you do not fall into any of the above categories, please include any materials, via either Zip file and/or hard-copy, that you think will define you and your work. Please detail, in this first 250-word essay, why this program would benefit you, and conversely, how you would benefit the program given your particular application.

Selection and Notification Process:

Fellows will be selected based on the strength of their application, self-initiative, self-motivation, and a candidates specific interest in the law. Candidates may be asked to interview as part of the application process.

Applicants can expect to receive a decision from us within two to three weeks after submitting their application. Our admissions process is competitive—each year we get many more applications than we have spaces for, so if you'd like to increase the likelihood of acceptance or need to know of an acceptance or rejection as soon as possible, obviously the sooner you apply the better it is for you. Non-US based applicants are strongly encouraged to apply sooner rather than later.

Application inquiries should be sent via e-mail to: sms@artlawoffice.com.